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palpitate    
vi. 悸动,心跳,发抖

悸动,心跳,发抖

palpitate
v 1: cause to throb or beat rapidly; "Her violent feelings
palpitated the young woman's heart"
2: shake with fast, tremulous movements; "His nostrils
palpitated" [synonym: {quiver}, {quake}, {palpitate}]
3: beat rapidly; "His heart palpitated" [synonym: {palpitate},
{flutter}]

Palpitate \Pal"pi*tate\, v. i. [imp. & p. p. {Palpitated}; p.
pr. & vb. n. {Palpitating}.] [L. palpitare, palpitatum, v.
intens. fr. pappare. See {Palpable}.]
To beat rapidly and more strongly than usual; to throb; to
bound with emotion or exertion; to pulsate violently; to
flutter; -- said specifically of the heart when its action is
abnormal, as from excitement.
[1913 Webster]


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  • Atomic layer deposition - Wikipedia
    Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical process; it is a subclass of chemical vapour deposition The majority of ALD reactions use two chemicals called precursors (also called "reactants")
  • Atomic Layer Deposition - an overview | ScienceDirect Topics
    Pt-SAC was obtained in one ALD cycle, and Pt nanoparticles (NPs) were formed after two cycles HAADF-STEM images showed a uniform dispersion of Pt1 atoms on the NCNS, and there are no visible NPs clusters at low and high magnifications
  • Atomic layer deposition - Nature Reviews Methods Primers
    Film growth by ALD takes place by repeating cycles, each adding the same amount of material, which is typically less than a monolayer During an ALD cycle, the surface is sequentially
  • Atomic Layer Deposition Recipes - UCSB Nanofab Wiki
    Atomic layer deposition (ALD) utilizes sequential exposure cycles of 2 gaseous precursors to a substrate surface Each half-cycle exposes one of the precursors to the substrate (and in the absence of the other) to ensure a "saturated" coverage on the surface
  • Atomic Layer Deposition (ALD) - MilliporeSigma
    While in the CVD process two precursor materials, TMA and H 2 O, are jointly introduced into a reaction chamber to produce Al 2 O 3 which deposits on a substrate, in the ALD process the chemical reaction is split into two half-reactions
  • The ALD supercycle scheme used for growth of Mo1−x W x S2 alloys by. . .
    The ALD supercycle scheme used for growth of Mo1−x W x S2 alloys by alternating ALD cycles of MoS2 and WS2 The cycle fraction n (n + m) determines the composition x of the alloy,
  • TMDs Research with Atomic Layer Deposition (ALD) Technique
    Typically ALD process of each cycle is composed of two half-cycle The ALD process consists of sequential alternating pulses of gaseous chemical precursors to react with the substrate The individual gas-surface reactions are called ‘half-reactions’ that appropriately makeup only part of the materials
  • Optimizing Atomic Layer Deposition Using Flow and Pressure Control
    Spatial and temporal ALD are the two main types of ALD In temporal ALD, a carrier gas and two (or more) gas reactants are used in separate stages one after another In spatial ALD, the substrate is moved into separate growing chambers so that individual reactant gases never touch one another
  • Atomic layer deposition and other thin film deposition techniques: from . . .
    In this current review, we have explored the most used techniques in the depositions of thin film materials with a focus on the properties of film produced, and the advantages and disadvantages of each technique





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